| ModelSDC-580 | Types ofFully automatic wafer type | weight55kg |
| Specification（L*W*H） 1100*600*670mm | Material of baseAviation aluminum |
| Experimental platform320mm*320mm | Platform moveautomatic | |
| Platform movement range 160mm*20mm | Platform tiltManual tilting platform (optional)Electric tilting platform (optional) |
| CameraU3.0 | Type of lensHigh Fidelity Microscope Lens |
| Lens magnification6.4 times | zoom±5mm |
| Maximum shooting speed2500 frames/s more models optional | Front and rear adjustment of the lens30mm |
| Lens tilt adjustment±10° |
| Drop sampleAutomatic aspiration and injection | Wetting liquidFully automatic wetted |
| Dripping accuracy0.01 μL scalable picoliter system | Liquid injection movement methodManual (upgradeable to automatic) |
| Liquid injection movement stroke60mm*60mm | Injection controlSoftware Digitization |
| Light sourceFocus LED | Wavelength450-480nm |
| Contact angle analysis (complete set)● | |
| Surface free energy analysisZisman、OWRK、WU、WU 2、Fowkes、Antonow、Berthelot、EOS、Adhesion work, wetting work, spreading coefficient | |
| Surface interfacial tension● | Forward/Backward angle● |
| Roll slip angle● | Dynamic Video Measurement● |
| Injection percentage● | Sloping form-- |
| Captive bubble method● | Top view measurement● |
| 3D formoptional | Temperature control platformoptional |
| Video shooting● | Online measurement● |
| Analysis method Three-phase automatic | Data export● |
| Programming test● | Morphology spectrum● |
| Fuzzy topography measurement● | Batch sessile drop method● |
| SoftwareContact angle V3/V5 | |
